Top Emission OLED

Aperture improvement is one of the urgent technological issues that AMOLED as display have competition with LCD. Because AMOLED uses multiple TFT in each pixels, it blocks a space light comes through. The top emission method is proposed to solve this problem and right now it is being researched for common use in the future. This report is to inspect the future development direction from the basic top emission contents to treating current development status as a whole.

PDF 30pages No.20 2006.06

The AMOLED’s development is required in order to realize the area enlargement, high imaging, and lowering power consumption. Aperture improvement is one of technological issues required for AMOLED as display competing against LCD. The least number of TFT to run AMOLED is two. This structure is composed of two TFT for each pixels and one capacitor. At least four or more TFT is required to create pixel equality security circuit, but such increase of TFT leads to decrease of aperture. Therefore, the TOP EMISSION method is proposed to solve these problems and currently lots of this research development is being progressed to apply.

Currently, there are many difficulties to realize the Top emission method. Clear electrode is one of the most important technologies in which its transmissivity and resistivity are important keys that the element’s ability directly depends on. The top emission method’s main technique is that the clear electrode creates a clear high electric conductivity by least damaging the organic compounds. Also, since top emission OLED requires clear encapsulation method, it needs the clear decicant. To support this method, hybrid encapsulation method or thin film encapsulation method that does the encapsulation without a cap are needed.

The top emission OLED’s structure and technological issue report that describes the recent development is published which is very useful to understand the overall top emission’s technology and the plans.

1.1 PMOLED ?????????????????????????????????????????????????????????????????????????????????4
1.2 AMOLED ????????????????????????????????????????????????????????????????????????????????5
2. TEOLED???????????????????????????????????????????????????????????????????????????????????????6
2.1 NEED OF TEOLED ????????????????????????????????????????????????????????????????????6
2.3 TEOLED history ???????????????????????????????????????????????????????????????????????10
3. TEOLED COMPOSITION ????????????????????????????????????????????????????????????????11
3.1 STRUCTURE????????????????????????????????????????????????????????????????????????????11
3.2.1 Normal structure?????????????????????????????????????????????????????????????????11
3.2.2 Inverted structure???????????????????????????????????????????????????????????????12
3.2 CLEAR ELECTRODE??????????????????????????????????????????????????????????????????13
3.2.1 Metallic thin film?????????????????????????????????????????????????????????????????13
3.2.2 Oxide????????????????????????????????????????????????????????????????????????????????14
3.2.3 Non-oxide??????????????????????????????????????????????????????????????????????????14
4. MAIN TECHNICS AND SOLUTIONS?????????????????????????????????????????????????16
4.1 Problems of clear electrode???????????????????????????????????????????????????????????16
4.1.1 Plasma damage????????????????????????????????????????????????????????????????????16
4.1.2 Metallic thin film penetration??????????????????????????????????????????????????18
4.2 Micro Cavity effects????????????????????????????????????????????????????????????????????18
4.3 Anode optical feature???????????????????????????????????????????????????????????????????22
4.4 Encapsulation?????????????????????????????????????????????????????????????????????????????23
5. Present state developments???????????????????????????????????????????????????????????????25

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